Potential barrier formed at n-ZnSe regrowth homointerface by molecular beam epitaxy

Citation
Y. Yamagata et al., Potential barrier formed at n-ZnSe regrowth homointerface by molecular beam epitaxy, J CRYST GR, 202, 1999, pp. 623-626
Citations number
6
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
623 - 626
Database
ISI
SICI code
0022-0248(199905)202:<623:PBFANR>2.0.ZU;2-G
Abstract
Electrical properties of n-ZnSe homointerfaces formed by MBE regrowth proce ss have been investigated by I-V and C-V measurements of Au/n-ZnSe Schottky diodes, and their analyses considering the interface state density distrib ution. I-V and C-Ti behavior of an air-exposed regrown sample was simultane ously fitted by using a superposed distribution of a U-shape and a discrete distribution of interface states with their density between 10(12) and 10( 13) cm(-2) eV(-1). Such a high-density of interface states was somewhat dec reased by regrowth pretreatments using an HCl solution and saturated bromin e water. (C) 1999 Elsevier Science B.V. All rights reserved.