Selective molecular beam epitaxy (MBE) growth of GaAs AlAs ridge structures containing 10 nm scale wires and side quantum wells (QWs) and their stimulated emission characteristics

Citation
S. Koshiba et al., Selective molecular beam epitaxy (MBE) growth of GaAs AlAs ridge structures containing 10 nm scale wires and side quantum wells (QWs) and their stimulated emission characteristics, J CRYST GR, 202, 1999, pp. 810-813
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
810 - 813
Database
ISI
SICI code
0022-0248(199905)202:<810:SMBE(G>2.0.ZU;2-X
Abstract
We report on the formation and optical characteristics of ridge waveguide s tructures containing quantum wires (QWRs). To form a waveguide? we adopted digital alloys, i.e. short-period superlattices (SLs), rapid changes of As fluxes using valved cells, growth temperatures (T-s), and introduction of g rowth interruptions. Stimulated emission from these ridge QWR laser structu res was observed at temperatures 4.7-290 K by optical pumping. (C) 1999 Els evier Science B.V. All rights reserved.