Arsenic incorporation in molecular beam epitaxy (MBE) grown (AlGaIn)(AsSb)layers for 2.0-2.5 mu m laser structures on GaSb substrates

Citation
S. Simanowski et al., Arsenic incorporation in molecular beam epitaxy (MBE) grown (AlGaIn)(AsSb)layers for 2.0-2.5 mu m laser structures on GaSb substrates, J CRYST GR, 202, 1999, pp. 849-853
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
849 - 853
Database
ISI
SICI code
0022-0248(199905)202:<849:AIIMBE>2.0.ZU;2-8
Abstract
The incorporation of As and In during MBE growth in (AlGaIn)/(AsSb) layers used for the fabrication of diode lasers in the 2.0-2.5 mu m wavelength ran ge has been investigated. The As content was found to depend linearly on th e beam equivalent pressure for As mole fractions between y = 0.05 and y = 0 .20. Broad area AlGaAsSb/GaInAsSb single-quantum well laser diodes with qua si-cw output at room temperature at an emission wavelength of 2.03 mu m and a threshold current density of 515 A/cm(2) for 1370 mu m long and 70 mu m wide devices have been fabricated. In order to shift the emission wavelengt h of the laser structures to longer wavelengths, the growth of lattice matc hed AlGaAsSb/GaInAsSb laser core structures with different In and As mole f ractions in the quantum wells has been investigated. (C) 1999 Elsevier Scie nce B.V. All rights reserved.