Gas source MBE growth and characterization of TlInGaP and TlInGaAs layers for long wavelength applications

Citation
H. Asahi et al., Gas source MBE growth and characterization of TlInGaP and TlInGaAs layers for long wavelength applications, J CRYST GR, 202, 1999, pp. 1069-1072
Citations number
8
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
1069 - 1072
Database
ISI
SICI code
0022-0248(199905)202:<1069:GSMGAC>2.0.ZU;2-G
Abstract
New III-V semiconductors TIInGaP and TIInGaAs (Tl composition of less than 0.1) are grown on InP substrates by gas source molecular beam epitaxy. They are proposed for long wavelength optical devices as well as temperature-in sensitive wavelength laser diodes. Grown layers are characterized by the me asurements on the temperature variation of photoconductance and photolumine scence. It is observed that the bandgap energy shows small-temperature vari ation suggesting the existence of temperature-independent bandgap energy in these material systems for the layers with increased Tl composition. (C) 1 999 Elsevier Science B.V. All rights reserved.