V. Steiner et al., Influence of trapping parameters on ion injection and dissociation efficiencies in a quadrupole mass filter ion trap tandem instrument, J MASS SPEC, 34(5), 1999, pp. 511-520
Investigations on ion injection into a laboratory-built quadrupole/ion trap
tandem instrument (Nermag R10-10/ITMS Finnigan) with a 90 degrees geometry
are described. The quadrupole dual electron impact/chemical ionization (EI
/CI) source was used as an external source to prepare ions under EI (or CI)
conditions. They were selected by the quadrupole analyzer and injected int
o the ion trap by using an electrostatic quadrupolar deflector. The effects
of major trapping parameters (i.e. ion injection r.f. level and helium pre
ssure) were considered. The injection efficiency of the stable CF3+ (m/z 69
) fragment ion from FC43 and also those of the m/z 40 and 84 atomic cations
of argon and krypton depend upon the injection r.f. level conditions. As e
xpected, effects of son-linear resonances were observed during these experi
ments. Under certain injection and trapping conditions, ion motion can be s
trongly affected, yielding ion ejection, because non-linear fields (resulti
ng from device imperfections) are present in addition to the quadrupolar po
tential required for ion trapping. The influences of non-linear effects acc
ording to their strength were investigated to show the best and worst trapp
ing conditions. The nan-linear resonances are characterized by the expected
beta(z) values. In order to determine the average internal energy deposite
d on the selected polyatomic ions during injection, butylbenzene molecular
ions were chosen as a model for internal energy measurement. The effects of
the r.f. injection level and helium pressure on the injected ion fragmenta
tion were studied. The M+. ions were only observed through a narrow injecti
on q(z) window. At low q(z) values, only low critical energy m/z 92 ions we
re detected, while the higher critical energy m/z 91 ions were observed at
higher q(z) values. Copyright (C) 1999 John Wiley & Sons, Ltd.