Positive and negative contrast lithography on silver quantum dot monolayers

Citation
Se. Henrichs et al., Positive and negative contrast lithography on silver quantum dot monolayers, J PHYS CH B, 103(18), 1999, pp. 3524-3528
Citations number
22
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHYSICAL CHEMISTRY B
ISSN journal
15206106 → ACNP
Volume
103
Issue
18
Year of publication
1999
Pages
3524 - 3528
Database
ISI
SICI code
1520-6106(19990506)103:18<3524:PANCLO>2.0.ZU;2-W
Abstract
Scanning nonlinear optical microscopy, at a resolution of similar to 2 mu m , was utilized to examine monolayers of alkylthiol-passivated silver nanocr ystals. Selected regions of the monolayers were irradiated with a pulse tra in of picosecond 1064 nm laser pulses, and then the second harmonic generat ion(SHG) response of those monolayers was recorded in a second scan. Two li thographic processes-one leading to a negative contrast SHG image (observed for particles <4 nm diameter) and a second leading to a positive contrast SH G image (observed for larger particles)-were found. These processes are explained within the context of literature models that account for particle size dependent energy partitioning.