Induced crystallographic orientations in electrodeposited Ni-Cu multilayers

The results of controlling the preferential crystallographic orientation of electrodeposited Ni-Cu multilayers by means of electrochemical methods are reported. These multilayers were grown on pulse electrodeposited and de el ectrodeposited copper foils of (111) and (220) preferential crystallographi c orientation, respectively Since multilayers have a tendency to grow epita xially, the multilayers grown on these substrates exhibited (111) or (220) preferential crystallographic orientation. Results of electrodeposition of multilayers on cold-rolled copper foil and on titanium are also presented. Similar results can be obtained using polycrystalline copper foil as compar ed to single crystal copper substrates. (C) 1999 The Electrochemical Societ y. S0013-4651(98)07-035-9. All rights reserved.