Nanometric Cu-Co multilayers electrodeposited on indium-tin oxide glass

Citation
E. Chassaing et al., Nanometric Cu-Co multilayers electrodeposited on indium-tin oxide glass, J ELCHEM SO, 146(5), 1999, pp. 1794-1797
Citations number
23
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
146
Issue
5
Year of publication
1999
Pages
1794 - 1797
Database
ISI
SICI code
0013-4651(199905)146:5<1794:NCMEOI>2.0.ZU;2-Q
Abstract
In the present work we report on the properties of Cu-Co nanometric multila yers electrodeposited on indium-tin oxide (ITO) glass using a single electr olyte and the pulse potential technique. We investigated the effect of the pulse potentials on the magnetism and magnetoresistance. The ITO glass subs trate allows the deposition of the multilayers directly on it and the chara cterization of their properties without separating them from the substrate. Optimal pulse potential ranges are characterized for both copper and cobal t deposition. The multilayers have a high magnetization and a large magneto resistance ratio. (C) 1999 The Electrochemical Society. S0013-4651(98)07-10 5-5. All rights reserved.