Bc. Li et al., Measuring the anisotropic thermal diffusivity of silicon nitride grains bythermoreflectance microscopy, J EUR CERAM, 19(8), 1999, pp. 1631-1639
High-resolution thermoreflectance microscopy measurements were performed at
five frequencies on rod-shaped Si3N4 grains in a ceramic. Our heat diffusi
on model takes account of the coating and of a coating/substrate resistance
. The parameters are adjusted to fit the measurements at the five frequenci
es simultaneously. The principal diffusivities obtained in individual grain
s are 0.32 cm(2) s(-1) along the a-axis, and 0.84 cm(2) s(-1) along the c-a
xis (corresponding conductivities: 69 and 180 Wm(-1) K-1). The thermal anis
otropy inside individual Si3N4 grains is found to be intrinsic, without dir
ect connection with their elongated shape. 'Macroscopic' diffusivities, obt
ained by mirage effect, are different from the values measured inside indiv
idual grains, as a consequence of the dispersion of the grains' orientation
s in the ceramic and of a second-phase effect. (C) 1999 Elsevier Science Li
mited. All rights reserved.