Growth and structure of epitaxial CeO2 by oxygen-plasma-assisted molecularbeam epitaxy

Citation
Yj. Kim et al., Growth and structure of epitaxial CeO2 by oxygen-plasma-assisted molecularbeam epitaxy, J VAC SCI A, 17(3), 1999, pp. 926-935
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
3
Year of publication
1999
Pages
926 - 935
Database
ISI
SICI code
0734-2101(199905/06)17:3<926:GASOEC>2.0.ZU;2-Z
Abstract
The epitaxial growth of CeO2 films on SrTiO3(001) has been investigated ove r a wide range of growth parameters using oxygen-plasma-assisted molecular beam epitaxy. The lattice mismatch for CeO2 on SrTiO3(001) is 2.0% (compres sive) if the film nucleates with a 45 degrees rotation about [001] relative to the substrate (i.e., CeO2(001)\\SrTiO3(001) and CeO2[110]\\SrTiO3[100]) . pure-phase, single-crystalline epitaxial films of CeO2(001) with the abov e epitaxial relationship readily grew on SrTiO3(001) for substrate temperat ures ranging from 550 to 700 degrees C. However, small amounts of (111) and (220) minority orientations also nucleated at the higher substrate tempera tures. In addition, the film surface was observed to become progressively s moother with increasing substrate temperature due to more extensive island agglomeration. The highest-quality him surface grown at 700 degrees C is un reconstructed and oxygen terminated. (C) 1999 American Vacuum Society. [S07 34-2101(99)02903-6].