TEMPERATURE QUENCHING OF TUNABLE TUNNELING RECOMBINATION EMISSION IN ALXGA1-XAS N-I-P-I DOPING STRUCTURES

Citation
Sj. Chua et al., TEMPERATURE QUENCHING OF TUNABLE TUNNELING RECOMBINATION EMISSION IN ALXGA1-XAS N-I-P-I DOPING STRUCTURES, Solid state communications, 102(10), 1997, pp. 739-742
Citations number
11
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
102
Issue
10
Year of publication
1997
Pages
739 - 742
Database
ISI
SICI code
0038-1098(1997)102:10<739:TQOTTR>2.0.ZU;2-J
Abstract
Competing emissions arising from e-h recombinations within the same la yer (spatial-direct) and across layers (spatial-indirect) in AlxGa1-xA s n-i-p-i doping structures have been studied using photoluminescence (PL). The emission from spatial-indirect transitions dominate at low t emperatures (<50K). The cross-over temperature, T-x, at which the spat ial-direct transition overtakes in intensity arising from spatial indi rect transition, is found to be dependent on intrinsic layer thickness and the doped layer concentrations but weakly dependent on the excita tion laser power density for values beyond 0.5 W cm(-2). The spatial-d irect transition is not observed when the intrinsic layer is not prese nt. The ratio of intensities between the spatial-direct to the spatial -indirect transitions is described by an exponential function which is in agreement with theoretical prediction. (C) 1997 Elsevier Science L td.