Effect of oxygen gas addition on preparation of iridium and platinum filmsby metal-organic chemical vapor deposition

Authors
Goto, T Vargas, JR Hirai, T
Citation
T. Goto et al., Effect of oxygen gas addition on preparation of iridium and platinum filmsby metal-organic chemical vapor deposition, MATER T JIM, 40(3), 1999, pp. 209-213
Citations number
26
Categorie Soggetti
Metallurgy
Journal title
MATERIALS TRANSACTIONS JIM
ISSN journal
09161821 → ACNP
Volume
40
Issue
3
Year of publication
1999
Pages
209 - 213
Database
ISI
SICI code
0916-1821(199903)40:3<209:EOOGAO>2.0.ZU;2-W
Abstract
The effect of oxygen gas addition on deposition rates, composition and micr ostructure was investigated in preparing Ir and Pt films by metal-organic c hemical vapor deposition using Ir- and Pt-acetylacetonate precursors. Witho ut the addition of oxygen gas, 20 mass% of carbon at most was contained in the films. The carbon was amorphous, surrounding metal particles of several nanometers in diameter. The addition of oxygen gas is effective in obtaini ng carbon-free Ir and Pt films, and the films grow epitaxially on MgO and s apphire single crystal substrates.