Vibrations of the interstitial oxygen pairs in silicon

Citation
M. Pesola et al., Vibrations of the interstitial oxygen pairs in silicon, PHYS REV L, 82(20), 1999, pp. 4022-4025
Citations number
25
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
82
Issue
20
Year of publication
1999
Pages
4022 - 4025
Database
ISI
SICI code
0031-9007(19990517)82:20<4022:VOTIOP>2.0.ZU;2-X
Abstract
First-principles methods are used to calculate the structures and local vib rational modes of interstitial oxygen pairs in silicon. The staggered Oi-Si -Oi and skewed O-i-Si-Si-O-t structures are nearly degenerate in energy. Th e calculated local vibration frequencies and their pure and mixed O-18 --> O-16 isotopic shifts agree closely with experiments: the highest frequency is assigned to the skewed and the four lower ones to the staggered structur e. This result may clear up the controversy of oxygen dimers in silicon. an d also suggests a mechanism for fast oxygen diffusion.