Graded interface effects on the carriers confinement in single GaN/AlxGa1-xN wurtzite quantum wells

Citation
H. Wang et al., Graded interface effects on the carriers confinement in single GaN/AlxGa1-xN wurtzite quantum wells, SOL ST COMM, 110(10), 1999, pp. 587-592
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
110
Issue
10
Year of publication
1999
Pages
587 - 592
Database
ISI
SICI code
0038-1098(1999)110:10<587:GIEOTC>2.0.ZU;2-3
Abstract
In this article, we present a theoretical study of graded interface effects on the carriers (electron and heavy-hole) confinement properties in single GaN/AlxGa1-xN quantum wells. The smooth interfaces are described assuming error function-like patterns for the interfacial aluminum molar fraction va riations, from which the carriers confinement potential and effective masse s are obtained. We show the occurrence of graded interface-related blue shi fts on the carriers confinement energies and intersubband transitions, whos e strength depends on the GaN/AlxGa1-xN quantum well and graded interface w idths. The highest intersubband transitions, which can occur within the com monly used square quantum well picture, are eliminated when the existence o f smooth interfaces is taken into account. (C) 1999 Elsevier Science Ltd. A ll rights reserved.