External surfaces can significantly alter the phase decomposition (PD) of p
olymer mixtures in thin films. The surface mode of PD orders two coexisting
phases in organised structures with laminated domain morphology. Such stru
ctures are employed in new polymer-based technologies of photoelectronic de
vices or microelectronic circuits. We studied the surface mode of PD in thi
n films composed of various binary mixtures of polystyrene with its deutera
ted- and partially brominated- counterpart. We have examined how PD is infl
uenced by: (a) surface active diblock copolymers admired to decomposing ble
nds, (b) substrate surface modification, and (c) finite film thickness. Thi
n films were studied by nuclear reaction analysis (NRA) and secondary ion m
ass spectroscopy (SIMS). The results provided composition profiles as a fun
ction of depth in the film with a nanometer precision, comparable with the
polymer chain dimensions. Lateral morphology was investigated by means of t
he atomic force microscope and optical microscope. Various laminated struct
ures composed of 2-, 3-, or 4- layers or column-like structures self-strati
fied from initially homogenous films were observed. (C) 1999 Published by E
lsevier Science Ltd. All rights reserved.