Development of a vacuum ultraviolet laser source and its application to the evaluation of phosphor materials for a plasma display panel

Citation
Y. Hirakawa et al., Development of a vacuum ultraviolet laser source and its application to the evaluation of phosphor materials for a plasma display panel, ANALYT CHIM, 389(1-3), 1999, pp. 69-76
Citations number
8
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ANALYTICA CHIMICA ACTA
ISSN journal
00032670 → ACNP
Volume
389
Issue
1-3
Year of publication
1999
Pages
69 - 76
Database
ISI
SICI code
0003-2670(19990514)389:1-3<69:DOAVUL>2.0.ZU;2-8
Abstract
Stimulated Raman scattering and four-wave Raman mixing are used for the gen eration of vacuum ultraviolet laser emission. A VUV spectrometer employing this vacuum ultraviolet source was designed and constructed for the evaluat ion of the phosphor materials currently used for a plasma display panel, wh ich utilizes a Xe discharge and produces vacuum ultraviolet emissions at 14 7 nm and 173 nm to excite the inorganic phosphors. The emission spectrum an d the temporal profile of the luminescence were measured by exciting the ph osphor at various ultraviolet and vacuum ultraviolet wavelengths, in order to investigate the dynamic processes of the phosphor material. (C) 1999 Els evier Science B.V. All rights reserved.