InAsSb InAsP strained-layer superlattice injection lasers operating at 4.0mu m grown by metal-organic chemical vapor deposition

Citation
B. Lane et al., InAsSb InAsP strained-layer superlattice injection lasers operating at 4.0mu m grown by metal-organic chemical vapor deposition, APPL PHYS L, 74(23), 1999, pp. 3438-3440
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
23
Year of publication
1999
Pages
3438 - 3440
Database
ISI
SICI code
0003-6951(19990607)74:23<3438:IISSIL>2.0.ZU;2-L
Abstract
We report high power mid-infrared electrical injection operation of laser d iodes based on InAsSb/ InAsP strained-layer superlattices grown on InAs sub strate by metal-organic chemical vapor deposition. The broad-area laser dio des with 100 mu m aperture and 1800 mu m cavity length demonstrate peak out put powers of 546 and 94 mW in pulsed and cw operation respectively at 100 K with a threshold current density as low as 100 A/cm(2). (C) 1999 American Institute of Physics. [S0003-6951(99)01123-7].