Raman microscopy of lateral epitaxial overgrowth of GaN on sapphire

Citation
M. Pophristic et al., Raman microscopy of lateral epitaxial overgrowth of GaN on sapphire, APPL PHYS L, 74(23), 1999, pp. 3519-3521
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
23
Year of publication
1999
Pages
3519 - 3521
Database
ISI
SICI code
0003-6951(19990607)74:23<3519:RMOLEO>2.0.ZU;2-O
Abstract
We have used confocal Raman microscopy to investigate lateral epitaxially o vergrown (LEO) GaN on sapphire substrates. The one-phonon Raman spectra are consistent with pyramidal growth of the GaN before coalescence has occurre d. The position and asymmetric line shape of the A(1) longitudinal optical (LO) phonon demonstrate that the LEO GaN is doped. The dopant is most likel y Si from the SiN mask used to produce the LEO GaN. The carrier concentrati on is estimated to be 1 x 10(17) cm(-3). We have also used Raman microscopy to spatially resolve the yellow emission from different regions of the LEO GaN. (C) 1999 American Institute of Physics. [S0003-6951(99)02123-3].