The time-resolved imaging of electron-hole recombination radiation from a f
orward-biased 4H-SiC p-i-n diode is reported. A novel approach of combining
gated charge couple device technique with cross-sectional emission microsc
opy is demonstrated as a fast and informative method for characterization o
f both 4H-SiC material properties and the overall power device performance.
We present the capability of the technique to visualize structural defects
, to characterize spatial distribution and dynamics of injected carriers, a
nd to provide effective carrier diffusion and lifetime parameters. From the
results of lateral and in-depth imaging of the light emission we conclude
that at low currents the injection of holes from the p(+) emission is domin
ant. Furthermore, an effective carrier lifetime of 350 ns in the active n(-
) region and a diffusion length of 15 mu m in the substrate are readily obt
ained. (C) 1999 American Institute of Physics. [S0003-6951(99)00722-6].