XPS depth profiling of powdered materials

Citation
H. Shimada et al., XPS depth profiling of powdered materials, APPL SURF S, 145, 1999, pp. 21-25
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
145
Year of publication
1999
Pages
21 - 25
Database
ISI
SICI code
0169-4332(199904)145:<21:XDPOPM>2.0.ZU;2-B
Abstract
XPS depth profiling of Al/Si ratios in three kinds of zeolite powders was c onducted by both destructive and non-destructive methods. Destructive profi ling with Ar+ sputtering gave Al/Si profiles consistent with those found by non-destructive methods, although the results pointed out possible errors due to preferential sputtering that in fact caused a serious distortion of the Na/Si profile. Analysis of the inelastic peak shape gave qualitative bu t undoubted information on the in-depth profile. Analysis using synchrotron radiation as an energy-tunable excitation source below 1000 eV revealed th e topmost surface composition but could not detect the compositional change in deeper regions. It was concluded that to minimize analytical errors, a combination of the above methods is needed for materials of such complexity . (C) 1999 Elsevier Science B.V. All rights reserved.