Azide complexes as forerunners for metallic thin films on Si surfaces

The deposition of films of metals, metal oxides and metal nitrides on surfa ces has attracted a great deal of interest due to their importance in the s emiconductor industry. An alternative method, which totally avoids the resi st technology, is to use the photodecomposition of azide complexes layers. We have initiated a study about photodecomposition of new compounds [Cr(N-3 )L(H2O)(2)](NO3)(2), [Ni(N-3)(2)L-2]. 10H(2)O, [CuN3L](NO3) (L = triethanol amine) and [Cr (N-3)L'(H2O)(4)](NO3)(2), [Cu(N-3)L'(H2O)](NO3) (L' = dietha nolamine) comparatively with [Cr(NH3)(5)N-3](2+), [Ni(NH3)(5)N-3](+) and [C u(NH3)(3)N-3](+). We have selected the best wavelengths for each of the com plexes after a detailed study of UV-spectra. (C) 1999 Elsevier Science B.V. All rights reserved.