Wl. Wang et al., Mechanism of diamond nucleation enhancement by electron emission via hot filament chemical vapor deposition, DIAM RELAT, 8(2-5), 1999, pp. 123-126
The mechanism of diamond nucleation enhancement by electron emission in the
hot filament chemical vapor deposition process has been investigated by sc
anning electron microscopy, Raman spectroscopy and infrared (IR) absorption
spectroscopy. The maximum value of the nucleation density was found to be
10(11) cm(-2) with a -300 V and 250 mA bias. The electron emission from the
diamond coating on the electrode excites a plasma, and greatly increases t
he chemical species, as we have seen by in situ IR absorption. The experime
ntal studies showed that the diamond and chemical species were transported
and scattered from the diamond coating on the electrode and through the pla
sma towards the substrate surface, where they caused enhanced nucleation. (
C) 1999 Elsevier Science S.A. All rights reserved.