A comparative study of composition, structure and elastic properties of boron nitride films deposited by magnetron and ion beam sputtering

Sputtering from hexagonal BN targets, using a conventional magnetron (MS) o r ion beam (IBS), produces films consisting of both sp(2)- and sp(3)-bonded BN and BNx. We present here the dependence of BN film composition, structu re, morphology and elastic properties on the bias voltage (V-b) applied on the substrate in the case of MS, compared with those of IBS-deposited BN fi lms. The optical properties and the composition of the BN films were examin ed by spectroscopic ellipsometry (SE), whereas the chemical bonding was ide ntified by Fourier Transform IR SE. The films' structure, morphology and de nsity were also examined by X-ray diffraction and reflectivity and transmis sion electron microscopy. The elastic properties of the films were studied by nanoindentation techniques. Significant differences were found in compos ition, chemical bonding and structure of films grown by MS at various bias voltages. (C) 1999 Elsevier Science S.A. All rights reserved.