Ultramicrohardness cross-profiling of CVD diamond steel brazed junctions

Citation
Ajs. Fernandes et al., Ultramicrohardness cross-profiling of CVD diamond steel brazed junctions, DIAM RELAT, 8(2-5), 1999, pp. 855-858
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
8
Issue
2-5
Year of publication
1999
Pages
855 - 858
Database
ISI
SICI code
0925-9635(199903)8:2-5<855:UCOCDS>2.0.ZU;2-L
Abstract
Thick microwave plasma chemical vapour deposition (MPCVD) diamond films (24 0, 480, 1000 mu m) were grown, laser cut and vacuum brazed to steel bars wi th an Ag/Cu/Ti (100 mu m) reactive filler metal. Displacement sensing inden tation experiments using a dynamic ultramicrohardness tester on the brazing layer were performed on different samples. A calibration curve for the res idual depth values was made by linear regression to diagonal measurements o n Vickers impressions. Corrected depth values were then used to evaluate th e hardness. The thicker the films were, the higher the hardness was found t o be. Hardness changes from 1.35 to 1.72 GPa, respectively, for the thinnes t and the thicker film joints, getting an increment of ca 35%. These data i ndicate a hardening effect during the cooling stage caused by thermal expan sion coefficients mismatch. An increment of ca 25% on the flexural stresses imposed by the film/substrate curvature was theoretically evaluated. The s ame trend variation with film thickness was found for both the hardness val ues and the brazing strength from previous work. Brazing layer hardness eva luation can be regarded as a non-destructive indirect way to assess the mec hanical resistance of the diamond/steel joints. (C) 1999 Elsevier Science S .A. All rights reserved.