Electron inelastic interactions with overlayer systems

Citation
Cm. Kwei et al., Electron inelastic interactions with overlayer systems, J APPL PHYS, 85(12), 1999, pp. 8247-8254
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
12
Year of publication
1999
Pages
8247 - 8254
Database
ISI
SICI code
0021-8979(19990615)85:12<8247:EIIWOS>2.0.ZU;2-7
Abstract
An overlayer system composed of a thin film on the top of a semi-infinite s ubstrate was studied in this work for electron inelastic interactions. Anal ytical expressions for the depth-dependent inelastic differential and integ ral inverse mean free paths were derived for both incident and escaping ele ctrons. The interface (film-substrate) effect and the surface (vacuum-film) effect were analyzed by comparing the results of an overlayer system and a semi-infinite system. It was found that the interface effect extended to s everal angstroms on both sides of the interface for a 500 eV electron incid ent into or escaping from the vacuum-SiO2-Si and the vacuum-Au-Ni systems. An application of the spatial-varying inelastic differential inverse mean f ree paths was made by Monte Carlo simulations of the electron elastic backs cattering from an overlayer system. Good agreement was found between result s calculated presently and data measured experimentally on the elastic refl ection coefficient. (C) 1999 American Institute of Physics. [S0021-8979(99) 00712-4].