The microstructure of Ga1-xAlxAs layers was studied using methods of h
igh resolution diffractometry and topography. Mapping out the reciproc
al space in the vicinity of 004 reciprocal lattice points shows a diff
erence in diffuse scattering between doped and undoped layers. This re
sult is attributed to a difference in a point-defect density. From the
measurements of lattice parameters at different temperature it was fo
und that the thermal expansion coefficients for the doped layers are h
igher than for the undoped ones. This phenomenon is attributed to the
change of the anharmonic part of lattice vibrations by free electrons
or/and point defects.