PHOTOELECTRON EMISSION MICROSCOPY AND ITS APPLICATION TO THE STUDY OFPOLYMER SURFACES

Citation
A. Cossyfavre et al., PHOTOELECTRON EMISSION MICROSCOPY AND ITS APPLICATION TO THE STUDY OFPOLYMER SURFACES, Acta Physica Polonica. A, 91(5), 1997, pp. 923-927
Citations number
14
Categorie Soggetti
Physics
Journal title
ISSN journal
05874246
Volume
91
Issue
5
Year of publication
1997
Pages
923 - 927
Database
ISI
SICI code
0587-4246(1997)91:5<923:PEMAIA>2.0.ZU;2-9
Abstract
The X-ray photoelectron emission microscopy at the Advanced Light Sour ce has a spatial resolution of 0.2 microns at an accelerating voltage of 12 kV. The tunability of the photon energy is used to provide chemi cal state information using near edge X-ray absorption fine structure spectroscopy on the sub-micrometer scale. The homogeneity of thin film s of polymer blends was studied for various film thicknesses. The poly styrene/polyvinylmethylether film of 194 Angstrom showed protrusions o f 2-3 mu m diameter with an enriched polystyrene content while the pol ystyrene/polystyreneacrylonitrile 504 Angstrom thick films showed 5-6 mu m segregated regions without any topological structure.