COMPARATIVE-STUDIES OF SURFACE-ROUGHNESS OF THIN EPITAXIAL SI FILMS BY COMPUTER-SIMULATIONS AND EXPERIMENTAL X-RAY AND OPTICAL METHODS

Authors
ZYMIERSKA D AULEYTNER J DOMAGALA J SZEWCZYK A DMITRUK N
Citation
D. Zymierska et al., COMPARATIVE-STUDIES OF SURFACE-ROUGHNESS OF THIN EPITAXIAL SI FILMS BY COMPUTER-SIMULATIONS AND EXPERIMENTAL X-RAY AND OPTICAL METHODS, Acta Physica Polonica. A, 91(5), 1997, pp. 1025-1030
Citations number
12
Categorie Soggetti
Physics
Journal title
Acta Physica Polonica. A → ACNP
ISSN journal
05874246
Volume
91
Issue
5
Year of publication
1997
Pages
1025 - 1030
Database
ISI
SICI code
0587-4246(1997)91:5<1025:COSOTE>2.0.ZU;2-N
Abstract
The paper presents investigations of the surface roughness of epitaxia l silicon films obtained by chemical vapour deposition with chloric an d MOCVD processes. The flat surfaces of films and chemically etched su rfaces of substrates were studied by optical methods as well as by X-r ay reflectivity at grazing incidence. The computer simulations based o n Fresnel theory were compared with the experimental results.