We describe a serial bideposition technique in which a tilted substrate is
rotated stepwise by half a turn about a normal axis during the evaporation
of a metal oxide from a single electron-beam source. Coatings formed by the
new method develop a columnar nanostructure that is perpendicular to the s
ubstrate and has greatest width or bunching perpendicular to the common dep
osition plane. With appropriate choice of deposition parameters, the method
produces biaxial films with large birefringence, principal axes aligned pa
rallel and perpendicular to the substrate, and improved uniformity. Measure
d phase retardances for light incident normally on the films are double the
corresponding values for tilted-columnar films. (C) 1999 Optical Society o
f America.