An analysis of the surface of the Ni-W layer of a tungsten film coating cathode

Authors
Ohira, T Teramoto, H Saito, M Shinjo, T
Citation
T. Ohira et al., An analysis of the surface of the Ni-W layer of a tungsten film coating cathode, APPL SURF S, 146(1-4), 1999, pp. 47-50
Citations number
4
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
146
Issue
1-4
Year of publication
1999
Pages
47 - 50
Database
ISI
SICI code
0169-4332(199905)146:1-4<47:AAOTSO>2.0.ZU;2-I
Abstract
Superior characteristics of a cathode operated with higher current density are required for achieving higher brightness and higher resolution of CRTs. An improved Sc2O3-dispersed-oxide cathode (conventional cathode) with tung sten film coating (new cathode) has been developed. The capability of the n ew cathode for high-current density operation is 1.8 times that of the conv entional Sc2O3-dispersed-oxide cathode [1]. Investigation of W behavior as well as typical characteristics of the new cathode in CRTs have been report ed. This new type of oxide-coated cathode will contribute to higher brightn ess and higher resolution of CRTs. (C) 1999 Elsevier Science B.V. All right s reserved.