The photolysis of perfluoropropyl fluoride and perfluoropropyl chloride vap
our was studied in the 12.9-79.0 Torr and 6.1-40.7 Torr pressure ranges, us
ing light of 232-240 and 254 nm, respectively. The products found were CF3C
F2COF: CO, C4F10 and COF2; CF3CF2COCl: CO, CF3CF2Cl, C4F10 and Cl-2. The qu
antum yield for the decomposition of CF3CF2COF was 0.4 +/- 0.06, independen
tly of the total pressure and light intensity while for CF3CF2COCl it was 1
.01 +/- 0.06 at 254 nm taken as phi((C2F5Cl+2C4F10)). When the photolysis w
as made in the presence of hydrogenated compounds, a clear hydrogen abstrac
tion took place in both the reactions, indicating the existence of radicala
ry mechanisms. No net effect of mechanisms and quantum yields were found on
the length of the carbon chain with respect to the perfluoro acetyl halide
s. Mechanisms for the decomposition of perfluoroacyl halides are discussed.
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