A diode laser and modeling study of mixed (CH4-H-2-O-2) AC plasmas

Citation
Wy. Fan et al., A diode laser and modeling study of mixed (CH4-H-2-O-2) AC plasmas, J PHYS CH A, 103(20), 1999, pp. 4118-4128
Citations number
25
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHYSICAL CHEMISTRY A
ISSN journal
10895639 → ACNP
Volume
103
Issue
20
Year of publication
1999
Pages
4118 - 4128
Database
ISI
SICI code
1089-5639(19990520)103:20<4118:ADLAMS>2.0.ZU;2-E
Abstract
Infrared diode laser spectroscopy has been used as a diagnostic probe to me asure the concentrations of the methyl radical and stable products in an ac methane/hydrogen/oxygen (CH4-H-2-O-2) plasma. Among the products detected were all of the stable C-2 hydrocarbons and oxygen-containing species inclu ding methanol, formaldehyde, formic acid, carbon monoxide, and carbon dioxi de. A simple one-dimensional chemical modeling program has been written to calculate and compare the model concentrations of all the detected species with their observed concentrations. Good agreement between these values has been obtained which enables some insights to be gained into the gas-phase mechanism in mixed methane plasmas.