Adsorption of heptanethiol on Cu(110)

Citation
G. Loepp et al., Adsorption of heptanethiol on Cu(110), LANGMUIR, 15(11), 1999, pp. 3767-3772
Citations number
33
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
15
Issue
11
Year of publication
1999
Pages
3767 - 3772
Database
ISI
SICI code
0743-7463(19990525)15:11<3767:AOHOC>2.0.ZU;2-3
Abstract
The adsorption kinetics of heptanethiol [CH3(CH2)(6)SH] on Cu(110) and the ordering of monolayer films prepared by ultrahigh vacuum vapor deposition h ave been studied by means of thermal-desorption spectroscopy, X-ray photoel ectron spectroscopy, low-energy electron diffraction, and scanning tunnelin g microscopy. Below 200 K, heptanethiol is found to grow in multilayers for which a molecular binding energy of 63 kJ/mol was determined. The formatio n of the chemisorbed monolayer takes place via a physisorbed precursor. Hea ting the chemisorbed layer leads to a dissociative desorption of the alkyl chain with an enthalpy of 117 kJ/mol. In contrast to the rather disordered physisorbed overlayer, several superstructures for the various coverages ha ve been observed for the chemisorbed phase. Heating the saturated monolayer to 350 K results in a well-ordered ((4)(-1)(0)(2)) structure.