Synthesis and radical polymerization of pyrocarbonate-functionalized monomers: application to positive-tone photoresists

The synthesis of two new tert-butyl carbonic anhydride monomers, 4-vinylben zoic and methacrylic tert-butylcarbonic anhydride was achieved successfully . Radical polymerization at 45 degrees C yielded tert-butyl pyrocarbonate p rotected materials. Thermographic analysis showed that both polymers decomp ose cleanly at 135 degrees C. The lithographic performance of both material s was evaluated in the presence of 2,4,6-tris-(trichloromethyl)-s-triazine as photoacid generating species. It was demonstrated that the large polarit y change results in a positively working chemically amplified photoresist s ystem.