MOCVD growth and characterization of AlGaInN multiple quantum well heterostructures and laser diodes

Citation
Dp. Bour et al., MOCVD growth and characterization of AlGaInN multiple quantum well heterostructures and laser diodes, MAT SCI E B, 59(1-3), 1999, pp. 33-38
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
59
Issue
1-3
Year of publication
1999
Pages
33 - 38
Database
ISI
SICI code
0921-5107(19990506)59:1-3<33:MGACOA>2.0.ZU;2-U
Abstract
We demonstrate room temperature, pulsed, current-injected operation of InGa AlN heterostructure laser diodes with mirrors fabricated by chemically assi sted ion beam etching. The multiple quantum well devices were grown by orga no-metallic vapor phase epitaxy on c-face sapphire substrates. The emission wavelengths of the gain-guided laser diodes were similar to 400 nm. The lo west threshold current density obtained was 6 kA cm(-2) with maximum output powers of 50 mW per facet. Optically-pumped distributed-feedback laser ope ration was also achieved. (C) 1999 Elsevier Science S.A. All rights reserve d.