We investigate the structure, morphology and optical properties of gallium
nitride (GaN) films deposited on (101) neodium gallate (NdGaO3) substrates
by molecular beam epitaxy. Scanning electron microscopy, X-ray diffraction,
photoluminescence and capacity-voltage measurements are used for the films
characterization. Comparison of the GaN/NdGaO3 layer properties with those
of GaN films grown on (0001) sapphire substrates has revealed the higher l
uminescence efficiency of the former. (C) 1999 Elsevier Science S.A. All ri
ghts reserved.