A new optical method for the characterisation of substrate/film interface p
roperties of GaN grown on GaAs is presented. It is based on reflectivity me
asurements over an extended spectral range. The influence of surface roughn
ess is separated by a comparison of the experimental data with calculations
for a smooth film above the band gap of GaN, while at lower energies, the
deviations from the calculated one-layer behaviour (without interface) are
strongly correlated to the effective refractive index of the interface n(in
t) and its thickness. It is shown that for GaAs substrates under certain MB
E growth conditions, n(int) is mainly determined by the void fraction. (C)
1999 Elsevier Science S.A. All rights reserved.