Investigation of the atomic structure of the pure edge and a plus c threading dislocations in gan layers grown by MBE

Citation
P. Ruterana et al., Investigation of the atomic structure of the pure edge and a plus c threading dislocations in gan layers grown by MBE, MAT SCI E B, 59(1-3), 1999, pp. 177-181
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
59
Issue
1-3
Year of publication
1999
Pages
177 - 181
Database
ISI
SICI code
0921-5107(19990506)59:1-3<177:IOTASO>2.0.ZU;2-H
Abstract
The active layers of GaN contain high densities of threading dislocations, which do not seem to exhibit important electrical activity. It is possible that this may change with time. About 90% are a type, with 1/3 [11 (2) over bar 0] Burgers vector and their line parallel to the [0001] growth directi on, the remaining 10% are a+c and pure edge c dislocations. High resolution electron microscopy investigation shows that the atomic structure of the a threading dislocations corresponds to 5/7 or eight atom ring cores with ra ther equal frequency. In modelling the a+c dislocation, it is shown that on ly the a component is visible in the images along the [0001], and that the effect of the screw component is spread symmetrically all over the area sur rounding the dislocation core. (C) 1999 Elsevier Science S.A. All rights re served.