Resonant electron tunneling in single quantum well heterostructure junction of electrodeposited metal semiconductor nanostructures using nuclear track filters

Citation
A. Biswas et al., Resonant electron tunneling in single quantum well heterostructure junction of electrodeposited metal semiconductor nanostructures using nuclear track filters, NUCL INST B, 151(1-4), 1999, pp. 84-88
Citations number
12
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
151
Issue
1-4
Year of publication
1999
Pages
84 - 88
Database
ISI
SICI code
0168-583X(199905)151:1-4<84:RETISQ>2.0.ZU;2-H
Abstract
We report on resonant electron tunneling through a Cu-Se heterostructure ju nction grown electrochemically in the submicron size pores (0.8 mu m) of a nuclear track filter (Polycarbonate). The prominent feature of negative dif ferential resistance (NDR) has been observed in the current-voltage (I-V) c haracteristic of the so-fabricated array of resonant tunneling diodes (RTDs ) even at room temperature, along with a significant peak to valley current ratio (2.5) of the resonance. Tunneling structures of the nanofabricated R TDs around zero bias are also observed at room temperature. Our results sho w that the low cost and relatively easy electrodeposition method can be a v ery effective way to prepare resonant quantum tunneling devices, using the pores of nuclear track filters. (C) 1999 Elsevier Science B.V. All rights r eserved.