High-resolution quantitative X-ray microanalysis of Nb Al multilayer thin films using the zeta-factor approach

Citation
G. Lucadamo et al., High-resolution quantitative X-ray microanalysis of Nb Al multilayer thin films using the zeta-factor approach, PHIL MAG A, 79(6), 1999, pp. 1423-1442
Citations number
34
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS ANDMECHANICAL PROPERTIES
ISSN journal
13642804 → ACNP
Volume
79
Issue
6
Year of publication
1999
Pages
1423 - 1442
Database
ISI
SICI code
1364-2804(199906)79:6<1423:HQXMON>2.0.ZU;2-K
Abstract
The use of high-resolution X-ray microanalysis in the study of thin-film re actions provides composition information useful for understanding phase for mation behaviour. The recently developed C-factor approach, in conjunction with data acquired on a high-spatial-resolution scanning transmission elect ron microscope, has been used successfully to obtain quantitative concentra tion profiles across layer interfaces in a Nb/Al multilayer. The use of the C-factor method permits efficient and simultaneous determination of the ab sorption correction and specimen thickness at each analysis point. The prep aration of a suitable composition standard and the theory of the C-factor a pproach are also discussed. The ultimate result is a high-spatial-resolutio n X-ray line profile of the Nb-Al interface corrected for absorption in the specimen thickness range from 50 to 125nm. The results demonstrate the pot ential of such an approach to other similar studies and represent a signifi cant step towards the application of analytical electron microscopy to the study of thin-film reaction phenomena.