In this paper we discuss 'early afterglow' studies on elementary kinetics i
n a pulsed rf discharge in N-2 and N-2-O-2 mixtures. In particular we revie
w the following topics: (a) LIF measurements of N-2(A (3)Sigma(u)(+)) densi
ty and upsilon = 0-9 vibrational distribution; (b) measurement of N-2(A (3)
Sigma(u)(+), upsilon = 2-7) quenching rate constants by O-2, O and NO; (c)
study of the NO(A (2)Sigma(+)) excitation; (d) N-2(B (3)Pi(g)) vibrational
distribution measurement and analysis of its excitation processes by means
of a kinetic model. New results are moreover presented and discussed: (e) t
wo-photon LIF (TALIF) measurements of O-atom density and loss rate; (f) LIF
measurements of NO density.