Stylus NanoProfilometry: A new approach to CD metrology

Citation
Jb. Bindell et al., Stylus NanoProfilometry: A new approach to CD metrology, SOL ST TECH, 42(6), 1999, pp. 45
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
42
Issue
6
Year of publication
1999
Database
ISI
SICI code
0038-111X(199906)42:6<45:SNANAT>2.0.ZU;2-E
Abstract
Accurate stylus control and automatic tip characterization has enabled a ne w level of performance from scanning probe microscopy, This technology has the potential to aid the leading edge of CD-SEM metrology and is widely app licable in processes with high-aspect-ratio structures in which wall angles and profile details are critical.