Extension of the fluidized bed silicon CVD process to non-conventional operating conditions - Depositions on porous powders and or under reduced pressure

Citation
Jrr. Ruvalcaba et al., Extension of the fluidized bed silicon CVD process to non-conventional operating conditions - Depositions on porous powders and or under reduced pressure, CHEM ENGN J, 73(1), 1999, pp. 61-66
Citations number
14
Categorie Soggetti
Chemical Engineering
Journal title
CHEMICAL ENGINEERING JOURNAL
ISSN journal
13858947 → ACNP
Volume
73
Issue
1
Year of publication
1999
Pages
61 - 66
Database
ISI
SICI code
1385-8947(199904)73:1<61:EOTFBS>2.0.ZU;2-U
Abstract
The applications field of the fluidized bed chemical vapor deposition proce ss has recently been extended towards an important industrial sector: the e laboration of supported catalysts. This necessitates non-conventionnal oper ating conditions, because depositions take place on porous powders, and und er reduced pressure. With the aim to analyze the possible modifications ind uced by these new working conditions, some experiments, and then simulation s have been done, using a well-known deposit, that of silicon from silane a nd disilane. The detailed analysis of results demonstrates the good applica bility of this process to this kind of elaborations.