Modelling of pulsed laser deposition of large area films

A novel technique for the deposition of thin films by pulsed laser depositi on over large substrate areas has been modelled. It is shown that by raster ing the ablation plume across the substrate as well as rotating the substra te, larger areas can be covered more uniformly than has been possible by pr eviously reported methods. Calculations demonstrate that film thickness val ues with only a +/-0.5% variation over substrates as large as 100 mm in dia meter could be produced by this method. These results compare favourably wi th other deposition techniques. (C) 1999 Elsevier Science B.V. All rights r eserved.