Electrical resistivity of Cu and Nb thin films and multilayers

We have measured the resistivity, temperature coefficient of resistivity (T CR) and grain sizes in single films of Cu and Nb as a function of film thic kness. We have compared our experimental results with the predictions of th e theory due to Dimmich. This theory allows us to extract a value for grain boundary reflectivity, R, which is subsequently used in the analysis of th e resistivity and TCR of Cu/Nb multilayers. We present our values for grain boundary reflectivity and the subsequent fit to the experimental resistivi ty and TCR using Dimmich's equations. (C) 1999 Elsevier Science B.V. All ri ghts reserved.