Characterisation of interfacial properties in sputtered Co Cu multilayers:X-ray reflectometry compared with TEM and AFM

Combining localised and global structural information we suggest that diffe rences in the maenetoresistive effect in the first maximum of antiferromagn etic coupling in Co/Cu multilayers can be attributed to the number of magne tic shortcuts localised at grain boundaries. In particular evidence is give n that the increased rms-roughness in samples without buffer as compared to samples grown on a Fe buffer can be attributed to a break off of the multi layer structure in adjacent grains. (C) 1999 Elsevier Science B.V. All righ ts reserved.