High-resolution x-ray diffraction on self-organized step bunches of Si1-xGex grown on (113)-oriented Si

Citation
J. Stangl et al., High-resolution x-ray diffraction on self-organized step bunches of Si1-xGex grown on (113)-oriented Si, J PHYS D, 32(10A), 1999, pp. A71-A74
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
32
Issue
10A
Year of publication
1999
Pages
A71 - A74
Database
ISI
SICI code
0022-3727(19990521)32:10A<A71:HXDOSS>2.0.ZU;2-L
Abstract
We present investigations of a highly regular terraced surface and interfac e structure of Si/SiGe multilayers on Si (113) by x-ray diffraction, x-ray reflectivity and atomic force microscopy. A regular array of step bunches w ith lateral periods of several hundred nanometres is formed during the grow th of the Si/Si1-xGex multilayers. X-ray diffraction patterns are simulated using the elastic Green function approach for the evaluation of the strain fields associated with the step edges, taking into account the relaxation towards the free surface. In addition to the terrace structure, a surface w aviness on the micrometre length scale is present, leading to a modulation of the terrace widths.