Comparison of benzo[a]pyrene DNA adduct formation in the skin of two strains of mice selected for resistance (DBA/2) or susceptibility (C3H/HeN) to contact dermatitis
Mc. Gorisse et al., Comparison of benzo[a]pyrene DNA adduct formation in the skin of two strains of mice selected for resistance (DBA/2) or susceptibility (C3H/HeN) to contact dermatitis, J TOX E H A, 57(4), 1999, pp. 283-292
Citations number
32
Categorie Soggetti
Environment/Ecology,"Pharmacology & Toxicology
Journal title
JOURNAL OF TOXICOLOGY AND ENVIRONMENTAL HEALTH-PART A
Two strains of mice were selected for resistance DBA/2 or susceptibility (C
3H/HeN) to contact dermatitis. Benzo[a]pyrene-DNA adduct formations was com
pared in the two mouse strains by a postlabeling procedure to determine if
there was a signigicant, effect. Results showed that adduct profiles in DBA
/2 and C3H/HeN dermis were qualitatively similar. The total binding levels
were higher in DBA/2 mice on the d 2 and the d 10. DNA adduct formation has
been shown to inversely correlate with skin allergy induction. Data sugges
t that the expression of the genes responsible for the differences in respo
nsiveness to chemical induced contact dermatitis in mouse may play an impor
tant role in benzo[a]pyrene-DNA adduct formation.