Kinetics of grain growth in 0-1 at.-%B doped nickel aluminide containing 23-2 at.-%Al

Citation
Mn. Mungole et al., Kinetics of grain growth in 0-1 at.-%B doped nickel aluminide containing 23-2 at.-%Al, MATER SCI T, 15(5), 1999, pp. 477-480
Citations number
19
Categorie Soggetti
Material Science & Engineering
Journal title
MATERIALS SCIENCE AND TECHNOLOGY
ISSN journal
02670836 → ACNP
Volume
15
Issue
5
Year of publication
1999
Pages
477 - 480
Database
ISI
SICI code
0267-0836(199905)15:5<477:KOGGI0>2.0.ZU;2-7
Abstract
Nickel aluminide containing 23.2 at.-%Al and 0.1 at.-%B was cold rolled and fully recrystallised at 825, 850, 875, 900, 925, 975, and 1000 degrees C. Increase in grain size as a function of isothermal annealing time at these temperatures was measured. All the data showed excellent fit with the devel oped equations. The value of m, the exponent of the grain growth equation ( D-m - D-o(m) = Kt), was 2.5. The activation energy for grain growth was 263 kJ g-atom(-1). Small changes in the boron content had an appreciable effec t on the kinetic parameters. This was attributed to the solute drag effect of boron. MST/4129