Influence of disorder in compensation-doped germanium on the critical indices of the metal-insulator transition

Citation
R. Rentzsch et al., Influence of disorder in compensation-doped germanium on the critical indices of the metal-insulator transition, PHYS SOL ST, 41(5), 1999, pp. 757-760
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICS OF THE SOLID STATE
ISSN journal
10637834 → ACNP
Volume
41
Issue
5
Year of publication
1999
Pages
757 - 760
Database
ISI
SICI code
1063-7834(199905)41:5<757:IODICG>2.0.ZU;2-Y
Abstract
We present a critical review of the present state of the critical exponent puzzle of the metal-insulator transition of doped semiconductors with empha sis on the role of meso- and macroscopic inhomogeneity caused by the disord er of intended or unintended acceptors and donors in crystals. By using bot h isotopic engineering and neutron transmutation doping (NTD) of germanium we found for low compensations (at K = 1.4 and 12%) that the critical expon ents of the localization length and the dielectric constant are nearly nu = 1/2 and zeta = 1, which double for medium compensations (at K = 38 and 54% ) to nu = 1 and zeta = 2, respectively. (C) 1999 American Institute of Phys ics. [S1063-7834(99)01905-X].